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February 21, 2012

Nanoporous membrane gives ion beam patterning powers

Ion irradiation through periodic nanochannel mask (

High-energy cobalt ions have been implanted into silica wafers through a periodic nanochannel membrane, which functions as a mask, in a collaboration between researchers from the Department of Materials Science and Engineering at Sheffield University and the Ion Beam Centre at Surrey University.

Journal Publication

  1. W Guan, J Ghatak, Y Peng, N Peng, C Jeynes, BJ Inkson and G Möbus, Patterned ion beam implantation of Co ions into a SiO2 thin film via ordered nanoporous alumina masks, Nanotechnology, 23(4), 045605 (2012)